Hitachi High-Technologies Launches Sale of New SU9000 Scanning Electron Microscope
Field Emission Scanning Electron Microscope Featuring Ultra-high Resolution Imaging
(published April 22, 2011) Hitachi High-Technologies Corporation (TOKYO: 8036, Hitachi High-Tech) announces the development and worldwide launch on April 19, 2011, of the SU9000, a new type of Field Emission Scanning Electron Microscope (FE-SEM) capable of ultra-high resolution imaging. The SU9000 is equipped with a newly developed electron source that enables ultra-high resolution observations, while minimizing sample damage caused by electron beams during observations.
SU9000 Ultra-High Resolution Field Emission Scanning Electron Microscope
SEMs are utilized in an array of fields, ranging from semiconductor devices, electronics, and advanced nanotechnology materials, to life sciences and medicine. SEMs from Hitachi High-Tech play an especially critical role in the field of semiconductor analysis, where they are indispensable for observing micro-level structures a) at the R&D stage, b) as part of production-floor process control, and c) in defect analysis. SEMs capable of supporting advanced technology of this kind require a number of important features beyond the capacity for outstanding high-resolution observations. These include the ability to perform observations using low accelerating voltages (Vacc), which minimize the sample damage caused by electron beams; throughput on the level of 100 or more observations a day; and stable operability that consistently allows for this performance.
The SU9000 is equipped with a new type of cold FE electron source for ultra-high resolution observations, an area of strength for Hitachi. Compared to previous versions, this new cold FE electron source is stable used for long periods, from right after startup with no wait times. The probe current within this stable range is approximately double that of earlier models, enabling bright images with superior S/N performance to be taken. Furthermore, Hitachi’s unique in-lens technology improves resolution under low accelerating voltage (1 kV) to 1.2 nm, and guarantees STEM resolution (optional) that can image the lattice structure of graphite (C (002) d=0.34 nm) at an accelerating voltage of 30 kV. The SU9000, while performing as an SEM boasting world-leading resolution of 0.4 nm (30 kV:SE image as of April 2011), also adopts a side-entry method for introducing samples for observation. This technique reduces the time for sample exchanges and the time to obtain a high-resolution photos to around 6 minutes or less (*1), permitting high-throughput data acquisition. The SU9000 also employs proprietary signal detection that enables high-contrast observations that can be tailored to the observation task, such as evaluation of morphology or composition. This new FE-SEM also has a large 24.1-inch widescreen monitor offering a comfortable environment for operating the device, as well as a new interface that enhances usability. Together, these innovations have delivered an environment that facilitates user operations.
*1 Reference time is based on the time required to photograph gold evaporation particles with an accelerating voltage of 5kV at 200,000 times magnification. Time may vary based on device installation conditions, the sample used, and photographic requirements.
Shipments are scheduled to commence from the first half of 2011.
Main Features of the SU9000
– Improved resolution during low accelerating voltage observation to minimize sample damage
– Newly developed cold field emission (FE) electron source featuring both low distortion and high-brightness, stable probe current
– Ultra-high vacuum sample chamber to minimize contamination
– High-rigidity frame and noise-dampening cover that allow high performance under a variety of installation conditions
– New interface and 24.1-inch widescreen monitor to enhance usability
About Hitachi High-Technologies
Hitachi High-Technologies was formed in 2001 through a merger of three companies that created a unique combination of manufacturing, sales, and service capabilities. The Instruments Group of Hitachi, Ltd. brought an established reputation in measuring technologies; the Semiconductor Manufacturing Equipments Group of Hitachi, Ltd. supported the efficiency of technology and the realization of more sophisticated performance; and Nissei Sangyo Co., Ltd., provided both a trading function specialized in cutting edge technology, with a focus on electronic products, and the ability to construct new businesses based on its global network. Further mergers added the chip mounter business in 2003 and the flat panel and hard disk related manufacturing systems experience of Hitachi Electronics Engineering Co., Ltd. in 2004. Hitachi High-Technologies now aims to be the global leader in high-tech solutions in its four business segments: electronic device systems, life sciences, information systems and electronic components, and advanced industrial products.
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