Exciting Nanofabrication Capabilities Are Now Available on Carl Zeiss Helium Ion Microscope
A new, integrated gas injection system on the ORION® Plus Helium Ion Microscope delivers superior nanofabrication, deposition and etch.
PEABODY/Massachusetts/USA, 02.08.2010. Carl Zeiss today introduced a new Gas Injection System for the ORION® Plus Helium Ion Microscope. The combination of a sub-nanometer (less than 0.35nm) probe of inert gas ions with a small interaction volume at the sample surface enables highly precise induction chemistries. The resulting structures have extremely small dimen- sions and high profile fidelity. This breakthrough technology is being unveiled at the M&M 2010 Conference in Portland, Oregon, August 1-5.
Dr. Paul Alkemade at the Kavli Institute of Nano- science, Delft University of Technology, is one of the early researchers in helium ion-induced de- position and etching. According to Dr. Alkemade, “The optimum instrument for nanofabrication requires both high spatial resolution and high deposition efficiency. Fortunately, the Helium ion beam on the ORION Plus instrument provides resolution for deposition that is even better than that achieved by a scanning electron microscope (SEM).
Tungsten Pillar deposited with Helium Ion Beam (7700nm tall and 45nm in diameter).
In addition, the Helium ion beam provides deposition efficiencies that are very similar to those achieved with a heavy ion (Ga) focused ion beam (FIB) instrument. With the integration of a Gas Injection System, the ORION Helium Ion Microscope is proving to be the right instrument for nanofabrication research.”
The controls for the Gas Injection System (GIS) are seamlessly integrated through the ORION Plus system software. The GIS unit contains three crucibles capable of delivering metal and insulator deposition and insulator etch chemistries. User programmable recipes can be created and recalled allowing for complex deposition and etch processes. The Gas Injection System on the Orion Plus creates a powerful and flexible platform enabling state-of-the-art nanofabrication applications.
To learn more about this exciting development, please visit Carl Zeiss SMT at booth 1274 at the M&M 2010 Conference in Portland, Oregon, or contact your Carl Zeiss SMT sales representative.
The Carl Zeiss Group is a leading group of companies operating worldwide in the optical and opto-electronic industries that generates revenues totaling around EUR 2.1 billion (2008/09). Carl Zeiss offers innovative solutions for the future-oriented markets of Medical and Research Solutions, Industrial Solutions and Lifestyle Products. The Carl Zeiss Group has approximately 13,000 employees worldwide, including more than 8,000 in Germany. The Carl Zeiss business groups hold leading positions in their markets. Carl Zeiss AG, Oberkochen, is fully owned by the Carl-Zeiss-Stiftung (Carl Zeiss Foundation).
Carl Zeiss SMT
Carl Zeiss SMT AG comprises the Semiconductor Technology Group of the Carl Zeiss Group. Carl Zeiss SMT is one of the leading manufacturers of lithography optics and light, electron and ion-optical inspection, analysis and measuring systems. The company offers a broad spectrum of application and service solutions for the fields of semiconductor technology, nanotechnology, materials research and life sciences. Carl Zeiss SMT AG is headquartered in Oberkochen, Germany. Other sites are located in Germany, the UK, France, the USA, Israel and Singapore. The company has a global workforce of over 2,400 people and generated revenues of just under EUR 400 million in fiscal year 2008/09. Carl Zeiss SMT AG is fully owned by Carl Zeiss AG, Oberkochen.
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